Gordon Shaw attended Skidmore College, where he received a BA in chemistry, and started his first research on the topic of plasma etching of titanium and tungsten. Subsequently, he worked in the semiconductor industry at EKC Technology Inc. (now DuPont electronic chemicals) studying the electrochemistry of metal and semiconductor corrosion in post-etch residue removal and Chemical Mechanical Planarization (CMP) chemistries. He received his PhD in analytical chemistry from the University of Wisconsin-Madison, studying the nanomechanical properties of nickel-titanium shape memory alloys.
He is currently in the Mass and Force Group at NIST, performing research in small mass and force metrology.
